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SPIE Proceedings [SPIE Photomask Technology 2005 - Monterey, California (Monday 3 October 2005)] 25th Annual BACUS Symposium on Photomask Technology - Analytical approximations of the source intensity distributions by Granik, Yuri; Weed, J. Tracy; Martin, Patrick M.; Adam, Kostas is a scholarly article available to read on EtoBox.

Author
Granik, Yuri; Weed, J. Tracy; Martin, Patrick M.; Adam, Kostas
Publisher
SPIE
Published
2005

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