About this scholarly article

Proceedings of the 2002 International Conference on Microelectronic Test Structures, 2002. ICMTS 2002. - CV doping profiling of boron out-diffusion using an abrupt and highly doped arsenic buried epilayer by Ortiz, C.J.; Nanver, L.K.; van Noort, W.D.; Scholtes, T.L.M.; Slotboom, J.W. is a scholarly article available to read on EtoBox.

Author

Ortiz, C.J.; Nanver, L.K.; van Noort, W.D.; Scholtes, T.L.M.; Slotboom, J.W.

Publisher

IEEE

Published

2002