About this scholarly article

2013 International Symposium on VLSI Technology, Systems and Application (VLSI-TSA) - 28nm high-k metal gate RRAM with fully compatible CMOS logic processes by Chin Yu Mei, ; Wen Chao Shen, ; Chih, Y -D.; Ya-Chin King, ; Chrong Jung Lin, is a scholarly article available to read on EtoBox.

Author

Chin Yu Mei, ; Wen Chao Shen, ; Chih, Y -D.; Ya-Chin King, ; Chrong Jung Lin,

Publisher

IEEE

Published

2013