Can I read Correlation of thin film adhesion with current noise measurements of Ta2N-Cr-Au resistors on sapphire and alumina substrates: W. E. Bibeau, W. A. Porter and D. L. Parker Proc. IEEE 28th Electron. Components Conf., Anaheim, 24–26 April 1978, p.427 on EtoBox?

Correlation of thin film adhesion with current noise measurements of Ta2N-Cr-Au resistors on sapphire and alumina substrates: W. E. Bibeau, W. A. Porter and D. L. Parker Proc. IEEE 28th Electron. Components Conf., Anaheim, 24–26 April 1978, p.427 is a Engineering article available to read on EtoBox.

What is Correlation of thin film adhesion with current noise measurements of Ta2N-Cr-Au resistors on sapphire and alumina substrates: W. E. Bibeau, W. A. Porter and D. L. Parker Proc. IEEE 28th Electron. Components Conf., Anaheim, 24–26 April 1978, p.427 about?

measurement equipment is increasing both for purposes of device evaluation and device development. A high-Q transmission line has been constructed and a mathematical system devised for employing that line in a resonant mode to determine capacitor parameters, and pariicularly Q-factor, at the range up to and including microwave frequencies. The device produces accurate, reliable data. The eqipment can be reproduced and the system used in analysis and evaluation with a degree of confidence not possible in the past.

Who reads Correlation of thin film adhesion with current noise measurements of Ta2N-Cr-Au resistors on sapphire and alumina substrates: W. E. Bibeau, W. A. Porter and D. L. Parker Proc. IEEE 28th Electron. Components Conf., Anaheim, 24–26 April 1978, p.427?

Publisher

Elsevier Science; Elsevier ; Elsevier Ltd; Elsevier BV (ISSN 0026-2692)

Published

1980

Language

EN

Field

Engineering (Physical Sciences)