About this scholarly article

SPIE Proceedings [SPIE International Symposium on Optical Science and Technology - Seattle, WA (Sunday 7 July 2002)] Advanced Characterization Techniques for Optical, Semiconductor, and Data Storage Components - Sub-nm topography measurement by deflectometry: flatness standard and wafer nanotopography by Geckeler, Ralf D.; Weingaertner, Ingolf; Duparr, Angela; Singh, Bhanwar is a scholarly article available to read on EtoBox.

Author

Geckeler, Ralf D.; Weingaertner, Ingolf; Duparr, Angela; Singh, Bhanwar

Publisher

SPIE

Published

2002