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About this Engineering article
Charge trapping in SiO2/HfO2/TiN gate stack by F Lime; G Ghibaudo; B. Guillaumot is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- F Lime; G Ghibaudo; B. Guillaumot
- Publisher
- Elsevier Science; Elsevier ; Elsevier BV (ISSN 0026-2714)
- Published
- 2003
- Field
- Engineering (Physical Sciences)