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About this Engineering article
Change in phase separation and electronic structure of nitrided Hf-silicate films as a function of composition and post-nitridation anneal by Cho, M.-H.; Chung, K. B.; Ko, D.-H. is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Cho, M.-H.; Chung, K. B.; Ko, D.-H.
- Publisher
- American Institute of Physics; AIP Publishing (ISSN 0003-6951)
- Published
- 2006
- Field
- Engineering (Physical Sciences)