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This document presents a method for fabricating nano-gap electrodes using focused ion beam (FIB) etching, enabling the creation of metallic electrodes with gaps of 5-8 nm. The approach involves patterning a metallic mask and transferring the pattern to an underlying electrode, which demonstrates excellent insulating properties suitable for measuring single molecules. The results indicate that this method is simple, reproducible, and effective for advancing molecular electronics.

Author

cloudytwilight

Language

EN