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The document provides an overview of nano and micro fabrication processes, focusing on semiconductor device fabrication, material properties, photolithography, oxidation, thin film deposition, metallization, and etching. It details the purpose and applications of various oxide layers in semiconductor devices, including gate oxide and field oxide, as well as methods for forming these layers. Additionally, it discusses furnace equipment used in these processes and the importance of oxidation rates in semicond

Author

lckrw137

Language

EN