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20th Annual BACUS Symposium on Photomask Technology : 13-15 September, 2000, Monterey, [California] USA by Brian J. Grenon, Giang T. Dao,chairs/editors; sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology, SPIE--the International Sociey for Optical Engineering; published by SPIE--the International Society for Optical Engineering is a book available to read on EtoBox.

Author
Brian J. Grenon, Giang T. Dao,chairs/editors; sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology, SPIE--the International Sociey for Optical Engineering; published by SPIE--the International Society for Optical Engineering
Publisher
Society of Photo-optical Instrumentation Engineers
Published
2001
Language
EN
ISBN
9780819438492
Subjects
Engineering, Stem

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