Opening book details…
About this Engineering article
Erratum: CVD and ALD Co(W) Films Using Amidinato Precursors as a Single-Layered Barrier/Liner for Next-Generation Cu-Interconnects [ECS J. Solid State Sci. Technol., 2, P311 (2013)] by Shimizu, H.; Suzuki, Y.; Nogami, T.; Tajima, N.; Momose, T.; Kobayashi, Y.; Shimogaki, Y. is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Shimizu, H.; Suzuki, Y.; Nogami, T.; Tajima, N.; Momose, T.; Kobayashi, Y.; Shimogaki, Y.
- Publisher
- The Electrochemical Society; Electrochemical Society, Inc. (ISSN 2162-8769)
- Published
- 2014
- Language
- EN
- Field
- Engineering (Physical Sciences)