About this scholarly article

SPIE Proceedings [SPIE SPIE's 1995 Symposium on Microlithography - Santa Clara, CA (Sunday 19 February 1995)] Advances in Resist Technology and Processing XII - Environmentally stable chemically amplified resist effects of organic salt additives by Yano, Ei; Kuramitsu, Yohko; Watanabe, Keiji; Namiki, Takahisa; Nozaki, Koji; Igarashi, Miwa; Allen, Robert D. is a scholarly article available to read on EtoBox.

Author

Yano, Ei; Kuramitsu, Yohko; Watanabe, Keiji; Namiki, Takahisa; Nozaki, Koji; Igarashi, Miwa; Allen, Robert D.

Publisher

SPIE

Published

1995

Language

EN