Skip to content

Opening book details…

About this Engineering article

Reliability study on polycrystalline silicon thin film resistors used in LSIs under thermal and electrical stress : Hiroko Akimori, Nobuo Owada, Tadayuki Taneoka and Hizura UDA. 28th A. Proc. Reliab. Phys. Symp. (IEEE), 276 (March 1990) is a Engineering article available to read on EtoBox.

It is typically read by researchers, students, and practitioners in Engineering.

Publisher
Elsevier Science; Elsevier ; Elsevier BV (ISSN 0026-2714)
Published
1991
Language
EN
Field
Engineering (Physical Sciences)