About this scholarly article

SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Metrology, Inspection, and Process Control for Microlithography XVIII - Sub-50-nm isolated line and trench width artifacts for CD metrology by Tortonese, Marco; Silver, Richard M.; Lorusso, Gian; Blanquies, Rene M.; Prochazka, Jerry; Grella, Luca is a scholarly article available to read on EtoBox.

Author

Tortonese, Marco; Silver, Richard M.; Lorusso, Gian; Blanquies, Rene M.; Prochazka, Jerry; Grella, Luca

Publisher

SPIE

Published

2004

Language

EN