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About this Engineering article
A Micro-contact and Wear Model for Chemical–mechanical Polishing of Silicon Wafers by Yongwu Zhao; L Chang is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Yongwu Zhao; L Chang
- Publisher
- Elsevier Science; Elsevier ; Elsevier BV (ISSN 0043-1648)
- Published
- 2002
- Field
- Engineering (Physical Sciences)