About this scholarly article

SPIE Proceedings [SPIE SPIE'S 1993 Symposium on Microlithography - San Jose, CA (Sunday 28 February 1993)] Advances in Resist Technology and Processing X - New silicon-containing negative resist for bilayer lithography by Jagannathan, Premlatha; Sooriyakumaran, Ratnam; Sachdev, Harbans S.; Hinsberg, William D. is a scholarly article available to read on EtoBox.

Author

Jagannathan, Premlatha; Sooriyakumaran, Ratnam; Sachdev, Harbans S.; Hinsberg, William D.

Publisher

SPIE

Published

1993