Can I read A study on a method of testing ion migration : Yuko Kanai et al. Proceedings (Condensed Version) 24th Symposium on Reliability and Maintainability, JUSE, Tokyo, Japan, Z (6–8 July 1994). on EtoBox?

A study on a method of testing ion migration : Yuko Kanai et al. Proceedings (Condensed Version) 24th Symposium on Reliability and Maintainability, JUSE, Tokyo, Japan, Z (6–8 July 1994). is a Engineering article available to read on EtoBox.

What is A study on a method of testing ion migration : Yuko Kanai et al. Proceedings (Condensed Version) 24th Symposium on Reliability and Maintainability, JUSE, Tokyo, Japan, Z (6–8 July 1994). about?

World abstracts on microelectronics and reliability 545 Electronics, 39 (1), 33 (1996). In this paper, we report a highly selective dry etching process for plasma chemical vapour deposited silicon nitride over undoped and n+-doped amorphous silicon. Dry etching is carried out in both CF4/H4 and nitrogen containing CF4/H 2 plasma gas mixtures. The effect of pressure, H2 and N 2 concentration on etch behaviour and selectivity is investigated. We report selectivities in the range of 2-40 for the differential etching of silicon nitride over doped/undoped amorphous silicon by using CFjH2 plasma gas combination. Higher etch rates with nitrogen containing CF4/H 2 are observed.

Who reads A study on a method of testing ion migration : Yuko Kanai et al. Proceedings (Condensed Version) 24th Symposium on Reliability and Maintainability, JUSE, Tokyo, Japan, Z (6–8 July 1994).?

Publisher

Elsevier Science; Elsevier ; Elsevier BV (ISSN 0026-2714)

Published

1997

Language

EN

Field

Engineering (Physical Sciences)