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About this Materials Science article
Hydrogen Plasma Treatment of Silicon Dioxide for Improved Silane Deposition by Gupta, Vipul; Madaan, Nitesh; Jensen, David S.; Kunzler, Shawn C.; Linford, Matthew R. is a Materials Science article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Materials Science.
- Author
- Gupta, Vipul; Madaan, Nitesh; Jensen, David S.; Kunzler, Shawn C.; Linford, Matthew R.
- Publisher
- American Chemical Society; American Chemical Society (ACS) (ISSN 0743-7463)
- Published
- 2013
- Field
- Materials Science (Physical Sciences)