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About this Engineering article

Use of annealed low-temperature grown GaAs as a selective photoetch-stop layer by E. H. Chen; D. T. Mcinturff; T. P. Chin; M. R. Melloch; J. M. Woodall is a Engineering article available to read on EtoBox.

It is typically read by researchers, students, and practitioners in Engineering.

Author
E. H. Chen; D. T. Mcinturff; T. P. Chin; M. R. Melloch; J. M. Woodall
Publisher
American Institute of Physics; AIP Publishing (ISSN 0003-6951)
Published
1996
Field
Engineering (Physical Sciences)

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