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This paper presents a comprehensive study on optimizing e-beam lithography (EBL) parameters for the nanofabrication of sub-50 nm gold nanowires and nanogaps using a bilayer lift-off process. The authors conducted over 200 EBL runs to systematically investigate the effects of various parameters such as exposure dose, soft-bake temperature, and development time, achieving feature sizes as small as 11 nm. The findings aim to provide a standardized methodology for EBL-based patterning of metallic nanostructures

Author

Arun Babu

Language

EN