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About this Engineering article
Deep UV Excitation Raman Spectroscopy of Homoepitaxial 4H-SiC Films Grown by Microwave Plasma Chemical Vapor Deposition by Okamoto, Mitsuo; Kosugi, Ryouji; Nakashima, Shinichi; Fukuda, Kenji; Arai, Kazuo is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Okamoto, Mitsuo; Kosugi, Ryouji; Nakashima, Shinichi; Fukuda, Kenji; Arai, Kazuo
- Publisher
- Trans Tech Publications, Ltd.; Trans Tech Publications Ltd. (ISSN 1662-9752)
- Published
- 2004
- Language
- EN
- Field
- Engineering (Physical Sciences)
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