Can I read Microstructure and Properties of Multilayer Coatings with Covalent Bonded Hard Materials on EtoBox?

Microstructure and Properties of Multilayer Coatings with Covalent Bonded Hard Materials by H Leiste; U Dambacher; S Ulrich; H Holleck is a Engineering article available to read on EtoBox.

What is Microstructure and Properties of Multilayer Coatings with Covalent Bonded Hard Materials about?

Single layer thin films of, preferably, covalent hard coatings SiC, Si 3 N 4 have been deposited by non-reactive r.f. and reactive d.c. magnetron sputtering. By sequential deposition they are combined with metallic hard coatings ( TiC, TiN ) to multilayer systems with an individual layer thickness of 1-500 nm of alternating covalent and metallic hard material layers on cemented carbide or quarz substrates. The reactive deposition was carried out at 400°C in an atmosphere of N 2 or CH 4 containing Ar by elementary targets (Si, Ti). The non-reactive deposited films were grown by the use of stoichiometric targets (SiC, Si 3 N 4 , TiN, TiC ) between room temperature and 550°C. The constitution of the single layer and multilayer thin films was studied by XRD, EMPA and HRTEM in dependence on the deposition parameters (substrate temperature, reactive gas flow) and related to the mechanical properties (hardness, adhesion). SiC films deposited by non-reactive sputtering in a stochiometric composition at temperatures between 200 and 550°C show an amorphous structure in XRD-studies. The microhardness was measured to 2600HV0.05 and the critical loads of failure in the scratch test below 30 N f

Who reads Microstructure and Properties of Multilayer Coatings with Covalent Bonded Hard Materials?

Author

H Leiste; U Dambacher; S Ulrich; H Holleck

Publisher

Elsevier Science; Elsevier ; Elsevier BV (ISSN 0257-8972)

Published

1999

Language

EN

Field

Engineering (Physical Sciences)