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About this Materials Science article
Plasma Etching of Niobium-SiOx Layers by D. Schelle; Dr. H. J. Tiller is a Materials Science article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Materials Science.
- Author
- D. Schelle; Dr. H. J. Tiller
- Publisher
- John Wiley and Sons; Wiley (John Wiley & Sons); Wiley - V C H Verlag GmbbH & Co.; Wiley (ISSN 0232-1300)
- Published
- 1986
- Language
- EN
- Field
- Materials Science (Physical Sciences)