About this Engineering article
Gate assisted Kelvin test structure to measure the electron and hole flows at the same nanowire contacts by Yuan, Hui; Badwan, Ahmad; Richter, Curt A.; Zhu, Hao; Kirillov, Oleg; Ioannou, Dimitris E.; Li, Qiliang is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Yuan, Hui; Badwan, Ahmad; Richter, Curt A.; Zhu, Hao; Kirillov, Oleg; Ioannou, Dimitris E.; Li, Qiliang
- Publisher
- American Institute of Physics; AIP Publishing (ISSN 0003-6951)
- Published
- 2014
- Language
- EN
- Field
- Engineering (Physical Sciences)