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About this Engineering article
High-speed Single-layer-resist Process and Energy-dependent Aspect Ratios for 0.2-μM Electron-beam Lithography by Murai, Fumio is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Murai, Fumio
- Publisher
- AVS (American Vacuum Society); American Vacuum Society; American Institute of Physics (ISSN 0734-211X)
- Published
- 1994
- Language
- EN
- Field
- Engineering (Physical Sciences)