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About this Engineering article
Broad defect depth distribution in germanium substrates induced by CF4 plasma by Kusumandari, ; Taoka, N.; Takeuchi, W.; Fukudome, M.; Sakashita, M.; Nakatsuka, O.; Zaima, S. is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Kusumandari, ; Taoka, N.; Takeuchi, W.; Fukudome, M.; Sakashita, M.; Nakatsuka, O.; Zaima, S.
- Publisher
- American Institute of Physics; AIP Publishing (ISSN 0003-6951)
- Published
- 2013
- Language
- EN
- Field
- Engineering (Physical Sciences)