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Identification of the Atomic-scale Defects Involved in the Negative Bias Temperature Instability in Plasma-nitrided P-channel Metal-oxide-silicon Field-effect Transistors by Campbell, J. P.; Lenahan, P. M.; Krishnan, A. T.; Krishnan, S. is a Physics and Astronomy article available to read on EtoBox.

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Author
Campbell, J. P.; Lenahan, P. M.; Krishnan, A. T.; Krishnan, S.
Publisher
American Institute of Physics; AIP Publishing; Publons (ISSN 0021-8979)
Published
2008
Language
EN
Field
Physics and Astronomy (Physical Sciences)