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About this Physics and Astronomy article
Identification of the Atomic-scale Defects Involved in the Negative Bias Temperature Instability in Plasma-nitrided P-channel Metal-oxide-silicon Field-effect Transistors by Campbell, J. P.; Lenahan, P. M.; Krishnan, A. T.; Krishnan, S. is a Physics and Astronomy article available to read on EtoBox.
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- Author
- Campbell, J. P.; Lenahan, P. M.; Krishnan, A. T.; Krishnan, S.
- Publisher
- American Institute of Physics; AIP Publishing; Publons (ISSN 0021-8979)
- Published
- 2008
- Language
- EN
- Field
- Physics and Astronomy (Physical Sciences)