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Design n-channel SOI MOSFET I-V Study by gargsaurabh454 is a document available to read on EtoBox.

The document outlines the design and simulation of an n-channel SOI MOSFET with a 1-micrometer gate length using Silvaco TCAD. It explains the theory behind Silicon-on-Insulator technology, detailing the structure and operational characteristics of SOI devices, including their advantages over bulk MOSFETs. The results include I-V characteristics and key parameters such as maximum drain current, leakage current, and threshold voltage.

Author
gargsaurabh454
Language
EN