About this scholarly article

The 2010 IEEE International Conference on Information and Automation - Five-beam Interference Pattern Model for laser interference lithography by Deng, Xiangying; Hu, Zhen; Xiu, Guowei; Li, Dayou; Yue, Yong; Song, Zhengxun; Weng, Zhankun; Xu, Jia; Wang, Zuobin is a scholarly article available to read on EtoBox.

Author

Deng, Xiangying; Hu, Zhen; Xiu, Guowei; Li, Dayou; Yue, Yong; Song, Zhengxun; Weng, Zhankun; Xu, Jia; Wang, Zuobin

Publisher

IEEE

Published

2010

Language

EN