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This study evaluates complex triarylsulfonium salts as photoacid generators for deep UV microlithography, detailing their synthesis, identification, and lithographic characterization. The authors describe the preparation of various sulfonium salts, analyze their acid-generating efficiency, and compare the lithographic performance of individual components against mixtures. The findings highlight the potential of these salts for use in DUV resists due to their desirable properties such as high acid generating

Author

bourme

Language

EN