About this scholarly article

SPIE Proceedings [SPIE 23rd Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 22 February 1998)] Emerging Lithographic Technologies II - Lithography on flexible substrates: a roll-to-roll high-throughput high-resolution system for low-cost production of microelectronics by Jain, Kanti; Dunn, Thomas J.; Farmiga, Nestor; Zemel, Mark; Weisbecker, Carl; Lee, Teik-Meng; Vladimirsky, Yuli is a scholarly article available to read on EtoBox.

Author

Jain, Kanti; Dunn, Thomas J.; Farmiga, Nestor; Zemel, Mark; Weisbecker, Carl; Lee, Teik-Meng; Vladimirsky, Yuli

Publisher

SPIE

Published

1998