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About this Engineering article
Influence of post-deposition annealing on characteristics of Pt/Al2O3/β-Ga2O3 MOS capacitors by Hirose, Masafumi; Nabatame, Toshihide; Yuge, Kazuya; Maeda, Erika; Ohi, Akihiko; Ikeda, Naoki; Irokawa, Yoshihiro; Iwai, Hideo; Yasufuku, Hideyuki; Kawada, Satoshi; Takahashi, Makoto; Ito, Kazuhiro; Koide, Yasuo; Kiyono, Hajime is a Engineering article available to read on EtoBox.
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- Author
- Hirose, Masafumi; Nabatame, Toshihide; Yuge, Kazuya; Maeda, Erika; Ohi, Akihiko; Ikeda, Naoki; Irokawa, Yoshihiro; Iwai, Hideo; Yasufuku, Hideyuki; Kawada, Satoshi; Takahashi, Makoto; Ito, Kazuhiro; Koide, Yasuo; Kiyono, Hajime
- Publisher
- Elsevier Science; Elsevier ; Elsevier BV (ISSN 0167-9317)
- Published
- 2019
- Field
- Engineering (Physical Sciences)