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About this Engineering article
Crystallization and ablation in annealing of amorphous-Si thin film on glass and crystalline-Si substrates irradiated by third harmonics of Nd3+:YAG laser by I.A. Palani; Nilesh J. Vasa; M. Singaperumal is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- I.A. Palani; Nilesh J. Vasa; M. Singaperumal
- Publisher
- Elsevier Science; Elsevier ; Elsevier Ltd.; Elsevier BV (ISSN 1369-8001)
- Published
- 2008
- Language
- EN
- Field
- Engineering (Physical Sciences)
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