About this scholarly article

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California (Monday 19 September 2011)] Photomask Technology 2011 - The trade-offs between thin and thick absorbers for EUV photomasks by McIntyre, Gregory; Maurer, Wilhelm; Abboud, Frank E.; Zuniga, Christian; Gallagher, Emily; Whang, John; Kindt, Louis is a scholarly article available to read on EtoBox.

Author

McIntyre, Gregory; Maurer, Wilhelm; Abboud, Frank E.; Zuniga, Christian; Gallagher, Emily; Whang, John; Kindt, Louis

Publisher

SPIE

Published

2011

Language

EN