About this Materials Science article
Mechanistic studies of the initial stages of etching of Si and SiO2 in a CHF3 plasma by Ch. Cardinaud; G. Turban is a Materials Science article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Materials Science.
- Author
- Ch. Cardinaud; G. Turban
- Publisher
- Elsevier Science; Elsevier ; Elsevier BV (ISSN 0169-4332)
- Published
- 1990
- Language
- EN
- Field
- Materials Science (Physical Sciences)