About this scholarly article

SPIE Proceedings [SPIE SPIE Proceedings - (Sunday 12 February 2012)] - Current density and exposure sequence effect in electron lithography by Dubonos, S. V.; Knyazev, M. A.; Svintsov, A. A.; Zaitsev, S. I.; Valiev, Kamil A.; Orlikovsky, Alexander A. is a scholarly article available to read on EtoBox.

Author

Dubonos, S. V.; Knyazev, M. A.; Svintsov, A. A.; Zaitsev, S. I.; Valiev, Kamil A.; Orlikovsky, Alexander A.

Publisher

SPIE

Published

2006