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Can I read High-aspect Ratio Permanent Photomask for Solid-state Chemical Sensing Array on EtoBox?
High-aspect Ratio Permanent Photomask for Solid-state Chemical Sensing Array by Hang Chen; Frederic L'Hereec; Isao Sasaki; Jirı́ Janata is a Engineering article available to read on EtoBox.
What is High-aspect Ratio Permanent Photomask for Solid-state Chemical Sensing Array about?
Four polymeric materials were tested for developing high-aspect ratio photomask on silicon wafer. A 166 mm thick mask was successfully made using spin-on epoxy. It showed good adhesion to silicon dioxide, good chemical stability towards common organic solvents and excellent mechanical strength. A procedure for removing it from the wafer has been also developed.
Who reads High-aspect Ratio Permanent Photomask for Solid-state Chemical Sensing Array?
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Hang Chen; Frederic L'Hereec; Isao Sasaki; Jirı́ Janata
- Publisher
- Elsevier Science; Elsevier ; Elsevier Sequoia; Elsevier BV (ISSN 0040-6090)
- Published
- 2003
- Language
- EN
- Field
- Engineering (Physical Sciences)
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