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The document discusses a study on reducing particle contamination in plasma-etching equipment by dehydrating the chamber wall. It identifies that particles, primarily composed of AlF3, are generated from the reaction of Al2O3 coating on the chamber wall with fluorine-containing plasma in the presence of absorbed water. The study demonstrates that dehydration through plasma discharge effectively suppresses particle generation, improving the efficiency and yield of the etching process.
- Author
- engp7826
- Language
- EN