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About this Engineering article
Effect of Energy and Dose on Transient-Enhanced Diffusion and Defect Microstructure in Low Energy High Dose As+ Implanted Si by Krishnamoorthy, V.; Venables, D.; Moeller, K.; Jones, K. S.; Freer, B. is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Krishnamoorthy, V.; Venables, D.; Moeller, K.; Jones, K. S.; Freer, B.
- Publisher
- Cambridge University Press; Cambridge University Press (Materials Research Society); Cambridge University Press (CUP) (ISSN 0272-9172)
- Published
- 1996
- Language
- EN
- Field
- Engineering (Physical Sciences)