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About this Engineering article
Low-temperature integration of lead-based ferroelectric capacitors on Si with diffusion barrier layer by Liu, B. T.; Maki, K.; Aggarwal, S.; Nagaraj, B.; Nagarajan, V.; Salamanca-Riba, L.; Ramesh, R.; Dhote, A. M.; Auciello, O. is a Engineering article available to read on EtoBox.
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- Author
- Liu, B. T.; Maki, K.; Aggarwal, S.; Nagaraj, B.; Nagarajan, V.; Salamanca-Riba, L.; Ramesh, R.; Dhote, A. M.; Auciello, O.
- Publisher
- American Institute of Physics; AIP Publishing (ISSN 0003-6951)
- Published
- 2002
- Field
- Engineering (Physical Sciences)