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About this Engineering article
Annealing of implantation damage and redistribution of impurities in SiC using a pulsed excimer laser by S. Y. Chou; Y. Chang; K. H. Weiner; T. W. Sigmon; J. D. Parsons is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- S. Y. Chou; Y. Chang; K. H. Weiner; T. W. Sigmon; J. D. Parsons
- Publisher
- American Institute of Physics; AIP Publishing (ISSN 0003-6951)
- Published
- 1990
- Language
- EN
- Field
- Engineering (Physical Sciences)
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