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About this Engineering article

Modeling of Chemical Vapor Deposition in a Fluidized Bed Reactor Based on Discrete Particle Simulation by Czok, Gregor; Ye, Mao; Kuipers, J. A. M. Hans; Werther, Joachim is a Engineering article available to read on EtoBox.

It is typically read by researchers, students, and practitioners in Engineering.

Author
Czok, Gregor; Ye, Mao; Kuipers, J. A. M. Hans; Werther, Joachim
Publisher
Walter de Gruyter GmbH & Co. KG; Walter de Gruyter GmbH (ISSN 2194-5748)
Published
2005
Language
EN
Field
Engineering (Physical Sciences)

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