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About this Engineering article
Comparative study of calixarene and HSQ resist systems for the fabrication of sub-20 nm MOSFET device demonstrators by J. Kretz; L. Dreeskornfeld; G. Ilicali; T. Lutz; W. Weber is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- J. Kretz; L. Dreeskornfeld; G. Ilicali; T. Lutz; W. Weber
- Publisher
- Elsevier Science; Elsevier ; Elsevier BV (ISSN 0167-9317)
- Published
- 2005
- Language
- EN
- Field
- Engineering (Physical Sciences)
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