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About this Engineering article
Mask-induced Best-focus Shifts in Deep Ultraviolet and Extreme Ultraviolet Lithography by Erdmann, Andreas; Evanschitzky, Peter; Neumann, Jens Timo; Gräupner, Paul is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Erdmann, Andreas; Evanschitzky, Peter; Neumann, Jens Timo; Gräupner, Paul
- Publisher
- The International Society for Optical Engineering; SPIE - International Society for Optical Engineering; S P I E - International Society for Optical Engineering; SPIE-Intl Soc Optical Eng (ISSN 1932-5150)
- Published
- 2016
- Field
- Engineering (Physical Sciences)
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