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About this Engineering article
Arbitrary photo-patterning in liquid crystal alignments using DMD based lithography system by Wu, Hao; Hu, Wei; Hu, Hua-chao; Lin, Xiao-wen; Zhu, Ge; Choi, Jae-Won; Chigrinov, Vladimir; Lu, Yan-qing is a Engineering article available to read on EtoBox.
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- Author
- Wu, Hao; Hu, Wei; Hu, Hua-chao; Lin, Xiao-wen; Zhu, Ge; Choi, Jae-Won; Chigrinov, Vladimir; Lu, Yan-qing
- Publisher
- Optical Society of America; The Optical Society; Washington DC: Optical Society of America, 1997- (ISSN 1094-4087)
- Published
- 2012
- Language
- EN
- Field
- Engineering (Physical Sciences)