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CD error budget analysis for 0.18-μm inlaid trench lithography by 18820901372 is a document available to read on EtoBox.
This document presents a CD error budget analysis for 0.18um inlaid trench lithography, highlighting the challenges in patterning small features due to various lithographic errors. The study utilizes experimental data and simulations to evaluate the impact of process variations on critical dimension (CD) control, emphasizing the importance of focus determination and the benefits of thin photoresists and phase shift masks. Key findings include significant improvements in CD control with optimized processes a
- Author
- 18820901372
- Language
- EN