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About this Engineering article
Dry etching of III–V semiconductors in CH3I, C2H5I, and C3H7I discharges by Chakrabarti, U. K. is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Chakrabarti, U. K.
- Publisher
- AVS (American Vacuum Society); American Vacuum Society; American Institute of Physics (ISSN 0734-211X)
- Published
- 1992
- Field
- Engineering (Physical Sciences)