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About this Engineering article
Thermal stability of (HfO2)x(Al2O3)1−x on Si by Yu, H. Y.; Wu, N.; Li, M. F.; Zhu, Chunxiang; Cho, B. J.; Kwong, D.-L.; Tung, C. H.; Pan, J. S.; Chai, J. W.; Wang, W. D.; Chi, D. Z.; Ang, C. H.; Zheng, J. Z.; Ramanathan, S. is a Engineering article available to read on EtoBox.
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- Author
- Yu, H. Y.; Wu, N.; Li, M. F.; Zhu, Chunxiang; Cho, B. J.; Kwong, D.-L.; Tung, C. H.; Pan, J. S.; Chai, J. W.; Wang, W. D.; Chi, D. Z.; Ang, C. H.; Zheng, J. Z.; Ramanathan, S.
- Publisher
- American Institute of Physics; AIP Publishing (ISSN 0003-6951)
- Published
- 2002
- Field
- Engineering (Physical Sciences)