About this scholarly article

2010 International Symposium on Next Generation Electronics - CESL deposition promoting n/p MOSFETs under 45-nm-node process fabrication by Wang, Mu-Chun; Yang, Hsin-Chia; Liao, Wen-Shiang; Yang, Hsiu-Yen; Hoe, Yao-Yuan; Lin, Kuang-Hung; Chen, Shuang-Yuan is a scholarly article available to read on EtoBox.

Author

Wang, Mu-Chun; Yang, Hsin-Chia; Liao, Wen-Shiang; Yang, Hsiu-Yen; Hoe, Yao-Yuan; Lin, Kuang-Hung; Chen, Shuang-Yuan

Publisher

IEEE

Published

2010

Language

EN