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About this Engineering article
mr-NIL 6000LT – Epoxy-based curing resist for combined thermal and UV nanoimprint lithography below 50 °C by Christine Schuster; Freimut Reuther; Anett Kolander; Gabi Gruetzner is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Christine Schuster; Freimut Reuther; Anett Kolander; Gabi Gruetzner
- Publisher
- Elsevier Science; Elsevier ; Elsevier BV (ISSN 0167-9317)
- Published
- 2009
- Language
- EN
- Field
- Engineering (Physical Sciences)